Lithographic systems use complex optics and special lens assemlies – e.g. for wafer inspection. These have to handle high intensity throughput and need to fulfill strict requirements on imaging qualitity. The priority is the monitoring and analysis of the optical quality and the transmitted wavefront error – from the first prototypes to mass production.
When adjusting and monitoring optical systems, Shack-Hartmann wavefront sensors for the DUV and UV range provide precise measurement of the laser optical system with high intrinsic stability. Thanks to the Zernike analysis of the wavefront, even the finest misalignments are detected. The corresponding information can be accessed via the extended I/O functions of the Shack-Hartmann software, e.g. for automated adjustment of the laser optical system.
In addition to the transmitted wavefront in the field, SHSInspect inspection systems measure the focal length, PSF/MTF and field curvature of lithographic lens assemblies. The semi-automated measurement ensures minimal operator influence.
Our solution for lithography applications
SHSInspect systems are used for the comprehensive characterization of lenses, also in the DUV and UV range between 193nm and 400nm.
SHSLab wavefront sensors provide for fast and precise adjustment and monitoring of optical systems.
